Temperature stability of sputtered niobium oxide films
Melville, NY / AIP (2002) [Journal Article]
Journal of applied physics
Volume: 91
Page(s): 4863-4863
Authors
Selected Authors
Venkataraj, S.
Drese, Robert Jens
Liesch, C.
Kappertz, Oliver
Jayavel, R.
Other Authors
Wuttig, Matthias
Identifier
- DOI: 10.1063/1.1458052
- REPORT NUMBER: RWTH-CONV-026954